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Author Topic: Rotate mode foy glyph window  (Read 1686 times)
jamespuckett
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« on: 2010-07-19, 18:51:20 »

It would be great if I there were a switch to rotate the glyph window 180, 90 or -90 degrees so that I can view and edit glyphs sideways, which is helpful when assessing the shape of curves.
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Ray Larabie
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« Reply #1 on: 2010-07-20, 23:29:45 »

Definitely. Really useful for X.
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Yuri Yarmola (FontLab)
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« Reply #2 on: 2010-07-21, 09:24:51 »

I don't get this, please explain. What is wrong with rotating glyph inside of the GW?
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Arno Enslin
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« Reply #3 on: 2010-07-21, 14:35:31 »

@ Yuri

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What is wrong with rotating glyph inside of the GW?

If you rotate the glyph, but not the glyph window, the rotated glyph will be stored in the font. I also think, that the function, for which James asks, is useful. Except from that humans can better control horizontal gestures (on a graphic tablet for example), as far as I know.
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Ray Larabie
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« Reply #4 on: 2010-07-22, 21:13:52 »

It could be similar to the way Photoshop now lets you rotate your viewpoint without rotating the artwork. Fractal/Corel Painter was the first to let you do that, I think. Maybe an arbitrary angle instead of just 90 degree increments.
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Arno Enslin
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« Reply #5 on: 2010-07-23, 02:41:10 »

@ Ray

If the angle is arbitrary, you maybe can control the position of the nodes with less precision. I am not sure. Rotation by 90 degree is lossless. An angle different from 90 degree or multiples of 90 degree would be another rounding factor, wouldn’t it?
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jamespuckett
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« Reply #6 on: 2010-07-23, 19:48:03 »

I don't get this, please explain. What is wrong with rotating glyph inside of the GW?

First, after rotating the glyph -90° and then back 90° the points do not always return to the same positions; often the entire outline is shifted one or more units. I’m assuming that this is a rounding error. Second, if I also want to rotate the mask then the process of rotating and moving between layers starts adding up to a lot of time over the course of designing font, especially if I have several versions of the outline in the mask layer that I have to work around.
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Arno Enslin
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« Reply #7 on: 2010-07-24, 03:26:30 »

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First, after rotating the glyph -90° and then back 90° the points do not always return to the same positions; often the entire outline is shifted one or more units. I’m assuming that this is a rounding error.

That’s odd and it should not happen. Rotations by 90° are theoretical lossless. Even if the next version of FLS does not contain the rotation feature for the glyph window, the FLS developers should check, what is wrong with the 90° glyph rotation.
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